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1

Langmuir probe study of a magnetically enhanced RF plasma source at pressures below 0.1 Pa, статья

печ.

Plasma Sources Sci. Technol., 20 (4): Art. No. 045018, 2011. doi:10.1088/0963-0252/20/4/045018

6 pages

Kousal, J; Sebek, O; Cechvala, J; Biederman, H

2

Measurement of plasma parameters in the far-field plume of a Hall effect thruster, статья

печ.

Plasma Sources Sci. Technol., 20 (6): Art. No. 065012, 2011. doi:10.1088/0963-0252/20/6/065012

9 pages

Dannenmayer, K; Kudrna, P; Mazouffre, S

3

Time-Resolved Diagnostics of Dual High Power Impulse Magnetron Sputtering With Pulse Delays of 15 µs and 500 µs, статья

печ.

Contrib. Plasma Phys., 51 (2-3): 237–245, 2011. doi:10.1002/ctpp.201000065

9 pages

Stranak, V; Drache, S; Cada, M; Hubicka, Z; Hippler, R

4

Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges, статья

печ.

Eur. Phys. J. D, 64 (2-3): 427–435, 2011. doi:10.1140/epjd/e2011-20393-7

9 pages

Stranak, V; Wulff, H; Bogdanowicz, R; Drache, S; Hubicka, Z; Cada, M; Hippler, R

5

Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system, статья

печ.

Surf. Coat. Technol., 205 (8-9): 2755–2762, 2011. doi:10.1016/j.surfcoat.2010.10.030

8 pages

Stranak, V; Block, S; Drache, S; Hubicka, Z; Helma, CA; Jastrabik, L; Hippler, R

6

Time-resolved measurement of plasma parameters in the far-field plume of a low-power Hall effect thruster Plasma, статья

печ.

Sources Sci. Technol., 21 (5): Art. No. 055020, 2012. doi:10.1088/0963-0252/21/5/055020

9 pages

Dannenmayer, K; Kudrna, P; Mazouffre, S

7

Electron Temperature Measurement in a Premixed Flat Flame Using the Double Probe Method Contrib., статья

печ.

Plasma Phys., 52 (8): 692–698, 2012. doi:10.1002/ctpp.201200005

7 pages

Wild, J; Kudrna, P; Nevrly, V; Strizik, M; Bitala, P; Filipi, B; Zelinger, Z

8

Diagnostics of magnetized low temperature plasma by ball-pen probe, статья

печ.

Nukleonika, 57 (2): 297–300, 2012

4 pages

Adamek, J; Peterka, M; Gyergyek, T; Kudrna, P;

9

Highly ionized physical vapor deposition plasma source working at very low pressure, статья

печ.

Appl. Phys. Lett., 100 (14): Art. No. 141604, 2012. doi:10.1063/1.3699229 

3 pages

Stranak, V; Herrendorf, A-P; Drache, S; Cada, M; Hubicka, Z; Hippler, R

10

Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma, статья

печ.

J. Appl. Phys., 112 (9): Art. No. 093305, 2012. doi:10.1063/1.4764102

9 pages

Stranak, V; Herrendorf, A-P; Drache, S; Cada, M; Hubicka, Z; Bogdanowicz, R; Hippler, R

11

Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering, статья

печ.

Surf. Coat. Technol., 206 (11-12): 2801–2809, 2012. doi:10.1016/j.surfcoat.2011.11.043

9 pages

Stranak, V; Drache, S; Bogdanowicz, R; Wulff, H; Herrendorf, A-P; Hubicka, Z; Cada, M; Hippler, R

12

Time-Resolved Measurements of Plasma Properties Using Electrostatic Probes in the CrossField Discharge of a Hall Effect Thruster Contrib., статья

печ.

Plasma Phys., 53 (1): 63–68, 2013. doi:10.1002/ctpp.201310011 

6 pages

Dannenmayer, K; Kudrna, P; Mazouffre, S

13

Measurement of the plasma and neutral gas flow velocities in a low-pressure hollow-cathode plasma jet sputtering system, статья

печ.

Plasma Sources Sci. Technol., 22 (1): Art. No. 015020, 2013. doi:10.1088/0963-0252/22/1/015020

7 pages

Kluson, J; Kudrna, P

14

Time-resolved Langmuir probe investigation of hybrid high power impulse magnetron sputtering discharges, статья

печ.

Vacuum, 90 (Apr): 135–140, 2013. doi:10.1016/j.vacuum.2012.02.047

6 pages

Drache, S; Stranak, V; Herrendorf, A-P; Cada, M; Hubicka, Z; Hippler, R

15

Experimental Study of the Discharge in the Low Pressure Plasma Jet Sputtering System Contrib., статья

печ.

Plasma Phys., 53 (1): 10–15, 2013. doi:10.1002/ctpp.201310002

6 pages

Kluson, J; Kudrna, P; Kolpakova, A; Pickova, I; Hubicka, Z

16

Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering, статья

печ.

Surf. Coat. Technol., 222 (May): 112–117, 2013. doi:10.1016/j.surfcoat.2013.02.012

6 pages

Stranak, V; Herrendorf, A-P; Wulff, H; Drache, S; Cada, M; Hubicka, Z; Hippler, R

17

Application of the Ball-Pen Probe in Two Low-Temperature Magnetised Plasma Devices and in Torsatron TJ-K, статья

печ.

Contrib. Plasma Phys., 53 (1): 39–44, 2013. doi:10.1002/ctpp.201310007

6 pages

Adamek, J; Peterka, M; Gyergyek, T; Kudrna, P; Ramisch, M; Stroth, U; Cavalier, J

18

Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser, статья

печ.

J. Phys. D-Appl. Phys., 47 (40): Art. No. 405205, 2014. doi:10.1088/0022-3727/47/40/405205

6 pages

Pira, P; Burian, T; Kolpakova, A; Kudrna, P; Danis, S; Juha, L; Lancok, J; Vysin, L; Civis, S; Zelinger, Z; Kubat, P; Wild, J

19

The time-varying electron energy distribution function in the plume of a Hall thruster, статья

печ.

Plasma Sources Sci. Technol., 23 (6): Art. No. 065001, 2014. doi:10.1088/0963-0252/23/6/065001

8 pages

Dannenmayer, K; Mazouffre, S; Kudrna, P

20

Pulsed gas aggregation for improved nanocluster growth and flux, статья

печ.

Phys. Status Solidi A-Appl. Mat., 211 (5): 1189–1193, 2014. doi:10.1002/pssa.201330399

5 pages

Drache, S; Stranak, V; Berg, F; Hubicka, Z; Helm, CA; Hippler, R

21

Ionized vapor deposition of antimicrobial Ti–Cu films with controlled copper release, статья

печ.

Thin Solid Films, 550: 389–394, 2014. doi:10.1016/j.tsf.2013.11.001

6 pages

Stranak, V; Wulff, H; Ksirova, P; Zietz, C; Drache, S; Cada, M; Hubicka, Z; Bader, R; Helm, CA; Hippler, R

22

Study of mass and cluster flux in a pulsed gas system with enhanced nanoparticle aggregation,  статья

печ.

J. Appl. Phys., 116 (14): Art. No. 143303, 2014.

doi:10.1063/1.4897234

7 pages

Drache, S; Stranak, V; Hubicka, Z; Berg, F; Helm, CA; Hippler, R

23

Magnesium plasma diagnostics by heated probe and characterization of the Mg thin films deposited by thermionic vacuum arc technology,  статья

печ.

Plasma Sources Sci. Technol., 24 (3): Art. No. 035008, 2015.
doi:10.1088/0963-0252/24/3/035008

9 pages

Vladoiu, R; Mandes, A; Balan, VD; Prodan, G; Kudrna, P