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Юрьева Алёна Викторовна
Кандидат технических наук

Научно-образовательный центр Б.П. Вейнберга, Доцент

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Список публикаций

Количество записей: 17

  1. Юрьева, А. В. Вакуумное оборудование плазменных и ускорительных систем : электронный курс / А. В. Юрьева ; Национальный исследовательский Томский политехнический университет, Инженерная школа ядерных технологий, Научно-образовательный центр Б. П. ВейнбергаТомск : TPU Moodle, 2022. — Доступ по логину и паролю. — URL: https://design.lms.tpu.ru/course/view.php?id=4668

  2. Features of self-sustained magnetron sputtering of evaporating metal target / G. A. Bleykher [et al.] // Gas Discharge Plasmas and Their Applications (GDP 2019) : 14th International Conference, September 15–21, 2019, Tomsk, Russia / National Research Tomsk Polytechnic University (TPU) ; eds. Yu. D. Korolev, N. N. Koval. — 2019. — [С. 277]. — URL: http://earchive.tpu.ru/handle/11683/57759

  3. Metal Coatings Deposition Using Hot Target Magnetrons / V. P. Krivobokov [et al.] // Surface Modification of Materials by Ion Beams (SMMIB-2019) : 21st International Conference, 25-30 August 2019, Tomsk, Russia / National Research Tomsk Polytechnic University (TPU). — 2019. — [P. 86]. — URL: https://smmib.ru/assets/files/SMMIB2019_TOMSK_full.pdf#page=87

  4. Controlling the Properties of Metal Films Deposited Using Magnetron Sputtering Systems with Evaporative Targets / G. A. Bleykher [et al.] // Surface Modification of Materials by Ion Beams (SMMIB-2019) : 21st International Conference, 25-30 August 2019, Tomsk, Russia / National Research Tomsk Polytechnic University (TPU). — 2019. — [P. 106]. — URL: https://smmib.ru/assets/files/SMMIB2019_TOMSK_full.pdf#page=107

  5. The properties of Cu films deposited by high rate magnetron sputtering from a liquid target / G. A. Bleykher (Bleicher) [et al.] // Vacuum. — 2019. — Vol. 169. — [108914, 9 p.]. — URL: https://doi.org/10.1016/j.vacuum.2019.108914

  6. The role of thermal processes and target evaporation in formation of self-sputtering mode for copper magnetron sputtering / G. A. Bleykher (Bleicher) [et al.] // Vacuum. — 2018. — Vol. 152. — [P. 156-165]. — URL: https://doi.org/10.1016/j.vacuum.2018.03.020

  7. Peculiarities of metal coatings deposition using magnetron sputtering systems with hot and evaporative targets / G. A. Bleykher (Bleicher) [et al.] // Journal of Physics: Conference Series. — 2018. — Vol. 1115 : 6th International Congress "Energy Fluxes and Radiation Effects". 14th International Conference on Modification of Materials with Particle Beams and Plasma Flows (14th CMM). — [032065, 6 p.]. — URL: https://doi.org/10.1088/1742-6596/1115/3/032065

  8. Features of copper coatings growth at high-rate deposition using magnetron sputtering systems with a liquid metal target / G. A. Bleykher (Bleicher) [et al.] // Surface and Coatings Technology. — 2017. — Vol. 324. — [P. 111–120]. — URL: https://doi.org/10.1016/j.surfcoat.2017.05.065

  9. High-voltage MIS-gated GaN transistors / E. V. Erofeev [et al.] // Semiconductors : Scientific Journal. — 2017. — Vol. 51, iss. 9. — [P. 1229-1232]. — URL: https://doi.org/10.1134/S106378261709010X

  10. Bleykher (Bleicher), G. A. The energy flux onto substrate during coating deposition using magnetron with liquid metal target / G. A. Bleykher, A. O. Borduleva, A. V. Yuryeva // Energy Fluxes and Radiation Effects (EFRE-2016) : International Congress, October 2–7, 2016, Tomsk, Russia / National Research Tomsk Polytechnic University (TPU) ; eds. B. M. Kovalchuk [et al.]. — 2016. — [P. 234]. — URL: http://earchive.tpu.ru/handle/11683/35833

  11. Energy and substance transfer in magnetron sputtering systems with liquid-phase target / G. A. Bleykher (Bleicher) [et al.] // Vacuum. — 2016. — Vol. 124. — [P. 11-17]. — URL: http://dx.doi.org/10.1016/j.vacuum.2015.11.009

  12. Aluminum films deposition by magnetron sputtering systems:Influence of target state and pulsing unit / D. V. Sidelev [et al.] // URL: http://spbopen.spbau.com/PDF/Book_of_Abstracts_SPBOPEN_2016.pdf#page=571

  13. Aluminum films deposition by magnetron sputtering systems: Influence of target state and pulsing unit / D. V. Sidelev [et al.] // Journal of Physics: Conference Series. — 2016. — Vol. 741 : Optoelectronics, Photonics, Engineering and Nanostructures (Saint Petersburg OPEN 2016). — [012193, 5 p.]. — , . — URL: http://dx.doi.org/10.1088/1742-6596/741/1/012193

  14. Krivobokov, V. P. Erosion yield of metal surface under ion pulsed irradiation / V. P. Krivobokov, O. M. Stepanova, A. V. Yuryeva // Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. — 2013. — Vol. 315. — [P. 261-264]. — URL: http://www.sciencedirect.com/science/article/pii/S0168583X13004102

  15. Bleykher (Bleicher), G. A. Thermal processes and emission of atoms from the liquid phase target surface of a magnetron sputtering system / G. A. Bleykher (Bleicher), V. P. Krivobokov, A. V. Yuryeva // Russian Physics Journal. — 2015. — Vol. 58, № 4. — [P. 431-437]. — URL: http://link.springer.com/article/10.1007/s11182-015-0517-6

  16. Effect of material of the crucible on operation of magnetron sputtering system with liquid-phase target / A. V. Yuryeva [et al.] // Vacuum. — 2017. — Vol. 141. — [P. 135–138]. — URL: https://doi.org/10.1016/j.vacuum.2017.04.001

  17. Bleykher (Bleicher), G. A. Magnetron deposition of coatings with evaporation of the target / G. A. Bleykher (Bleicher), V. P. Krivobokov, A. V. Yuryeva // Technical Physics. — 2015. — Vol. 60, №12. — [P. 1790-1795]. — URL: http://dx.doi.org/10.1134/S1063784215120026